Davolio, G. and Vezzosi, I.M. (1974) Cinetica di deposizione del rame su elettrodo di cadmio da soluzioni di Cu++ in acido perclorico. Accademia Peloritana dei Pericolanti, Classe di Scienze FF. MM. NN., LIV. pp. 81-83.
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Abstract
The deposition kinetics of copper from perchloric solutions on Cd electrode have been studied by polarographic technique. The copper ions depletion follows a first order law: the kinetics constant is $0,5.10^-^5$ $moles.sec^-^1.cm^-^2$ for Cu deposition on fresh Cd electrodes, and $1.10^-^5 moles.sec^-^1.cm^-^2$ for deposition and previously corroded Cd electrodes.
Item Type: | Article |
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Subjects: | M.U.S. - Miscellanea > Atti Accademia Peloritana > Classe di Scienze Fisiche, Matematiche e Naturali > 1974 M.U.S. - Miscellanea > Atti Accademia Peloritana > Classe di Lettere Filosofia e belle Arti > 1974 |
Depositing User: | Dr A F |
Date Deposited: | 30 Oct 2012 12:32 |
Last Modified: | 30 Oct 2012 12:32 |
URI: | http://cab.unime.it/mus/id/eprint/1597 |
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